专利名称：Photolithographic method using non-photoactive resins
发明人：Monte A. Douglas
申请号：US07/994049
申请日：19921216
公开号：US05316895Axposed
公开日：
19940531
专利内容由知识产权出版社提供
摘要：A method for patterning an integrated circuit workpiece comprises depositing a layer of non-photoactive material on the wafer. A reagent is deposited onto the entire surface of the material. A pattern is then created by exposing the surface with an energy source which produces a reaction within the reagent and/or between the reagent and the resin. The unreacted reagent is then removed by either physical or chemical means. Finally, the unexposed material is removed by means of an etch.
申请人：TEXAS INSTRUMENTS INCORPORATED
代理人：Ira S. Matsil,James C. Kesterson,Richard L. Donaldson
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